Please use this identifier to cite or link to this item: https://elib.belstu.by/handle/123456789/36115
Title: Application of DC Magnetron Sputtering for Creation of Gas-Sensitive Indium Oxide Thin Films and Their Properties
Authors: Luhin, V.
Zarsky, I.
Zhucowki, P.
Keywords: technology
gas sensitive semiconductor structures
oxide thin films
sputtering of indium
magnetron sputtering
by magnetron
Issue Date: 2012
Citation: Application of DC Magnetron Sputtering for Creation of Gas-Sensitive Indium Oxide Thin Films and Their Properties / V. Luhin, I. Zarsky, P. Zhucowki // Acta Physica Polonica A. - 2012. - Vol. 123, № 5. - P. 837-839
Abstract: In this paper the technology of gas sensitive semiconductor structures based on oxide thin films by DC magnetron sputtering of indium with the subsequent thermal oxidation is developed. Structure, surface morphology and chemical composition of the obtained films have been investigated by electron diffraction, scanning electron microscopy, and X-ray photoelectron spectroscopy. Conditions of In₂O₃ films formation with higt selectivity and sensitivity to NO₂ are established.
URI: https://elib.belstu.by/handle/123456789/36115
Appears in Collections:Публикации в зарубежных изданиях

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